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Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K

Evgenii Yakovlevich Misochko 1
Evgenii Yakovlevich Misochko
Viktor Adol'fovich Benderskii 1
Viktor Adol'fovich Benderskii
Albert Udovich Goldschleger 1
Albert Udovich Goldschleger
Alexander Vladimirovich Akimov 1
Alexander Vladimirovich Akimov
Published 1995-10-30
CommunicationVolume 5, Issue 5, 198-200
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Misochko E. Y. et al. Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K // Mendeleev Communications. 1995. Vol. 5. No. 5. pp. 198-200.
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Misochko E. Y., Benderskii V. A., Goldschleger A. U., Akimov A. V. Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K // Mendeleev Communications. 1995. Vol. 5. No. 5. pp. 198-200.
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TY - JOUR
DO - 10.1070/MC1995v005n05ABEH000524
UR - https://mendcomm.colab.ws/publications/10.1070/MC1995v005n05ABEH000524
TI - Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K
T2 - Mendeleev Communications
AU - Misochko, Evgenii Yakovlevich
AU - Benderskii, Viktor Adol'fovich
AU - Goldschleger, Albert Udovich
AU - Akimov, Alexander Vladimirovich
PY - 1995
DA - 1995/10/30
PB - Mendeleev Communications
SP - 198-200
IS - 5
VL - 5
ER -
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@article{1995_Misochko,
author = {Evgenii Yakovlevich Misochko and Viktor Adol'fovich Benderskii and Albert Udovich Goldschleger and Alexander Vladimirovich Akimov},
title = {Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K},
journal = {Mendeleev Communications},
year = {1995},
volume = {5},
publisher = {Mendeleev Communications},
month = {Oct},
url = {https://mendcomm.colab.ws/publications/10.1070/MC1995v005n05ABEH000524},
number = {5},
pages = {198--200},
doi = {10.1070/MC1995v005n05ABEH000524}
}
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Misochko, Evgenii Yakovlevich, et al. “Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K.” Mendeleev Communications, vol. 5, no. 5, Oct. 1995, pp. 198-200. https://mendcomm.colab.ws/publications/10.1070/MC1995v005n05ABEH000524.

Abstract

Accumulation and conversion of CH3 radicals upon F2 photolysis in ternary mixtures Ar:F2:CH4 has been studied with EPR spectroscopy; the CH3 radical formation during photolysis period is caused by the reaction of’hot’ F atoms with CH4. At T > 18 K the thermally activated reaction of ’cold’ F atoms with CH4 was also detected; the activation energy of diffusion-controlled recombination of the F atoms falls short of that of F + CH4 reaction.

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