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One-electron Reduction of Verdazyl Salts by Metals

Tatiana G Samarskaya 1
Tatiana G Samarskaya
Leonid Nikolaevich Ganyuk 1
Leonid Nikolaevich Ganyuk
Vladimir Mikhailovich Ogenko 1
Vladimir Mikhailovich Ogenko
1 Institute of Surface Chemistry, National Academy of Sciences of Ukraine, Kiev, Ukraine
Published 1994-02-28
CommunicationVolume 4, Issue 1, 19-20
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Samarskaya T. G., Ganyuk L. N., Ogenko V. M. One-electron Reduction of Verdazyl Salts by Metals // Mendeleev Communications. 1994. Vol. 4. No. 1. pp. 19-20.
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Samarskaya T. G., Ganyuk L. N., Ogenko V. M. One-electron Reduction of Verdazyl Salts by Metals // Mendeleev Communications. 1994. Vol. 4. No. 1. pp. 19-20.
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TY - JOUR
DO - 10.1070/MC1994v004n01ABEH000331
UR - https://mendcomm.colab.ws/publications/10.1070/MC1994v004n01ABEH000331
TI - One-electron Reduction of Verdazyl Salts by Metals
T2 - Mendeleev Communications
AU - Samarskaya, Tatiana G
AU - Ganyuk, Leonid Nikolaevich
AU - Ogenko, Vladimir Mikhailovich
PY - 1994
DA - 1994/02/28
PB - Mendeleev Communications
SP - 19-20
IS - 1
VL - 4
ER -
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@article{1994_Samarskaya,
author = {Tatiana G Samarskaya and Leonid Nikolaevich Ganyuk and Vladimir Mikhailovich Ogenko},
title = {One-electron Reduction of Verdazyl Salts by Metals},
journal = {Mendeleev Communications},
year = {1994},
volume = {4},
publisher = {Mendeleev Communications},
month = {Feb},
url = {https://mendcomm.colab.ws/publications/10.1070/MC1994v004n01ABEH000331},
number = {1},
pages = {19--20},
doi = {10.1070/MC1994v004n01ABEH000331}
}
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Samarskaya, Tatiana G., et al. “One-electron Reduction of Verdazyl Salts by Metals.” Mendeleev Communications, vol. 4, no. 1, Feb. 1994, pp. 19-20. https://mendcomm.colab.ws/publications/10.1070/MC1994v004n01ABEH000331.

Abstract

The kinetics and mechanism of the reduction of verdazyl salts by metals (copper, zinc, tin, lead and aluminium), deposited in the form of films of 3–8 μm thickness on dielectric supports of ceramic glass, and by metal alloys in organic solvents, has been investigated by means of electron spectrophotometry and gravimetric analysis; the influence of the metal, medium polarity and the presence of certain additives (alkanediols, highly-dispersed silicon dioxide) upon the reaction kinetics has been established and as a result systems for metallic film etching have been developed.

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