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Dry Photochemical Etching of Metallic Films

Anatolii Veniaminovich Vannikov 1
Anatolii Veniaminovich Vannikov
, 
Antonina Dmitrievna Grishina 1
Antonina Dmitrievna Grishina
, 
Marine Guramovna Tedoradze 1
Marine Guramovna Tedoradze
10.1070/MC1992v002n02ABEH000135
Published 1992-06-30
Communication , Volume 2, Issue 2, 62-64
4
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Vannikov A. V., Grishina A. D., Tedoradze M. G. Dry Photochemical Etching of Metallic Films // Mendeleev Communications. 1992. Vol. 2. No. 2. pp. 62-64.
GOST all authors (up to 50) Copy
Vannikov A. V., Grishina A. D., Tedoradze M. G. Dry Photochemical Etching of Metallic Films // Mendeleev Communications. 1992. Vol. 2. No. 2. pp. 62-64.
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TY - JOUR
DO - 10.1070/MC1992v002n02ABEH000135
UR - https://mendcomm.colab.ws/publications/10.1070/MC1992v002n02ABEH000135
TI - Dry Photochemical Etching of Metallic Films
T2 - Mendeleev Communications
AU - Vannikov, Anatolii Veniaminovich
AU - Grishina, Antonina Dmitrievna
AU - Tedoradze, Marine Guramovna
PY - 1992
DA - 1992/06/30
PB - Mendeleev Communications
SP - 62-64
IS - 2
VL - 2
ER -
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@article{1992_Vannikov,
author = {Anatolii Veniaminovich Vannikov and Antonina Dmitrievna Grishina and Marine Guramovna Tedoradze},
title = {Dry Photochemical Etching of Metallic Films},
journal = {Mendeleev Communications},
year = {1992},
volume = {2},
publisher = {Mendeleev Communications},
month = {Jun},
url = {https://mendcomm.colab.ws/publications/10.1070/MC1992v002n02ABEH000135},
number = {2},
pages = {62--64},
doi = {10.1070/MC1992v002n02ABEH000135}
}
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Vannikov, Anatolii Veniaminovich, et al. “Dry Photochemical Etching of Metallic Films.” Mendeleev Communications, vol. 2, no. 2, Jun. 1992, pp. 62-64. https://mendcomm.colab.ws/publications/10.1070/MC1992v002n02ABEH000135.

Abstract

The illumination of a light sensitive polymer layer cast on top of a metallic film (Al or Bi) leads to etching of the metallic film; the light-sensitive layer consists of a polymer binder, including aromatic amines and hexabromodimethylsulfone; the additional use of an optical amplification process results in a new, dry, highly sensitive method of metallic film etching.

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