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Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications

Anatolii Veniaminovich Vannikov 1
Anatolii Veniaminovich Vannikov
, 
Antonina Dmitrievna Grishina 1
Antonina Dmitrievna Grishina
, 
Marine Guramovna Tedoradze 1
Marine Guramovna Tedoradze
10.1070/MC1991v001n01ABEH000020
Published 1991-03-31
Communication , Volume 1, Issue 1, 34-36
4
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Vannikov A. V., Grishina A. D., Tedoradze M. G. Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications // Mendeleev Communications. 1991. Vol. 1. No. 1. pp. 34-36.
GOST all authors (up to 50) Copy
Vannikov A. V., Grishina A. D., Tedoradze M. G. Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications // Mendeleev Communications. 1991. Vol. 1. No. 1. pp. 34-36.
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TY - JOUR
DO - 10.1070/MC1991v001n01ABEH000020
UR - https://mendcomm.colab.ws/publications/10.1070/MC1991v001n01ABEH000020
TI - Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications
T2 - Mendeleev Communications
AU - Vannikov, Anatolii Veniaminovich
AU - Grishina, Antonina Dmitrievna
AU - Tedoradze, Marine Guramovna
PY - 1991
DA - 1991/03/31
PB - Mendeleev Communications
SP - 34-36
IS - 1
VL - 1
ER -
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@article{1991_Vannikov,
author = {Anatolii Veniaminovich Vannikov and Antonina Dmitrievna Grishina and Marine Guramovna Tedoradze},
title = {Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications},
journal = {Mendeleev Communications},
year = {1991},
volume = {1},
publisher = {Mendeleev Communications},
month = {Mar},
url = {https://mendcomm.colab.ws/publications/10.1070/MC1991v001n01ABEH000020},
number = {1},
pages = {34--36},
doi = {10.1070/MC1991v001n01ABEH000020}
}
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Vannikov, Anatolii Veniaminovich, et al. “Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications.” Mendeleev Communications, vol. 1, no. 1, Mar. 1991, pp. 34-36. https://mendcomm.colab.ws/publications/10.1070/MC1991v001n01ABEH000020.

Abstract

A process of both photochemical and thermally induced chemical amplification of the effect of primary light irradiation has been realized in the photochemical crosslinking of polyvinylethylal layers containing diphenylbenzylamine and hexabromodimethylsulphone, allowing us to obtain new highly sensitive photoresists.

References

1.
10.1070/MC1991v001n01ABEH000020_bib1
Grishina
Khim. Vys. Energ., 1990
2.
10.1070/MC1991v001n01ABEH000020_bib2
Vannikov
Vysokomol. Soedin., Ser. A, 1990
3.
10.1070/MC1991v001n01ABEH000020_bib3
Crivello
Adv. Polym. Sci., 1984
4.
10.1070/MC1991v001n01ABEH000020_bib4
Vannikov
Fotokhimiya polimemikh donorno–aktseptornikh kompleksov, 1984
5.
10.1070/MC1991v001n01ABEH000020_bib5
Tedoradze
Zh. Nauchn. Prikl. Fotogr. Kinematogr., 1990