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Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing

Bato Chingisovich Kholkhoev 1
Bato Chingisovich Kholkhoev
, 
Zakhar Andreevich Matveev 1
Zakhar Andreevich Matveev
, 
Alena Nikolaevna Nikishina 2
Alena Nikolaevna Nikishina
, 
Vitaliy Fedorovich Burdukovskii 1
Vitaliy Fedorovich Burdukovskii
10.1016/j.mencom.2022.11.035
Published 2022-10-21
Communication , Volume 32, Issue 6, 813-815
6
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Kholkhoev B. C. et al. Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing // Mendeleev Communications. 2022. Vol. 32. No. 6. pp. 813-815.
GOST all authors (up to 50) Copy
Kholkhoev B. C., Matveev Z. A., Nikishina A. N., Burdukovskii V. F. Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing // Mendeleev Communications. 2022. Vol. 32. No. 6. pp. 813-815.
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TY - JOUR
DO - 10.1016/j.mencom.2022.11.035
UR - https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.11.035
TI - Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing
T2 - Mendeleev Communications
AU - Kholkhoev, Bato Chingisovich
AU - Matveev, Zakhar Andreevich
AU - Nikishina, Alena Nikolaevna
AU - Burdukovskii, Vitaliy Fedorovich
PY - 2022
DA - 2022/10/21
PB - Mendeleev Communications
SP - 813-815
IS - 6
VL - 32
ER -
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@article{2022_Kholkhoev,
author = {Bato Chingisovich Kholkhoev and Zakhar Andreevich Matveev and Alena Nikolaevna Nikishina and Vitaliy Fedorovich Burdukovskii},
title = {Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing},
journal = {Mendeleev Communications},
year = {2022},
volume = {32},
publisher = {Mendeleev Communications},
month = {Oct},
url = {https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.11.035},
number = {6},
pages = {813--815},
doi = {10.1016/j.mencom.2022.11.035}
}
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Kholkhoev, Bato Chingisovich, et al. “Polybenzimidazole-based thiol-ene photosensitive composition for DLP 3D printing.” Mendeleev Communications, vol. 32, no. 6, Oct. 2022, pp. 813-815. https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.11.035.

Keywords

3D printing
digital light processing
photopolymerization
polybenzimidazoles
thiol-ene polymerization

Abstract

Aphotosensitive composition based on N-allylated poly[2,2'-(p-oxydiphenylene)-5,5'-dibenzimidazole] and pentaerythritol tetrakis(3-mercaptopropionate) has been developed. This photosensitive composition is capable of forming cross-linked 3D-structures due to UV-initiated thiol-ene polymerization. Using digital light processing 3D printing, 3D-objects with high resolution, mechanical strength and thermal resistance up to 397 °C are formed.

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