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Effect of low-pressure radio-frequency air plasma on chitosan films

Margarita Sergeevna Rubina 1
Margarita Sergeevna Rubina
Alexander Victorovich Budnikov
Igor Vladimirovich Elmanovich 1
Igor Vladimirovich Elmanovich
Il'ya Olegovich Volkov 1
Il'ya Olegovich Volkov
Alexander Yur'evich Vasil'kov 1
Alexander Yur'evich Vasil'kov
Published 2022-03-06
CommunicationVolume 32, Issue 2, 283-285
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Rubina M. S. et al. Effect of low-pressure radio-frequency air plasma on chitosan films // Mendeleev Communications. 2022. Vol. 32. No. 2. pp. 283-285.
GOST all authors (up to 50) Copy
Rubina M. S., Budnikov A. V., Elmanovich I. V., Volkov I. O., Vasil'kov A. Y. Effect of low-pressure radio-frequency air plasma on chitosan films // Mendeleev Communications. 2022. Vol. 32. No. 2. pp. 283-285.
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TY - JOUR
DO - 10.1016/j.mencom.2022.03.044
UR - https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.044
TI - Effect of low-pressure radio-frequency air plasma on chitosan films
T2 - Mendeleev Communications
AU - Rubina, Margarita Sergeevna
AU - Budnikov, Alexander Victorovich
AU - Elmanovich, Igor Vladimirovich
AU - Volkov, Il'ya Olegovich
AU - Vasil'kov, Alexander Yur'evich
PY - 2022
DA - 2022/03/06
PB - Mendeleev Communications
SP - 283-285
IS - 2
VL - 32
ER -
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@article{2022_Rubina,
author = {Margarita Sergeevna Rubina and Alexander Victorovich Budnikov and Igor Vladimirovich Elmanovich and Il'ya Olegovich Volkov and Alexander Yur'evich Vasil'kov},
title = {Effect of low-pressure radio-frequency air plasma on chitosan films},
journal = {Mendeleev Communications},
year = {2022},
volume = {32},
publisher = {Mendeleev Communications},
month = {Mar},
url = {https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.044},
number = {2},
pages = {283--285},
doi = {10.1016/j.mencom.2022.03.044}
}
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MLA Copy
Rubina, Margarita Sergeevna, et al. “Effect of low-pressure radio-frequency air plasma on chitosan films.” Mendeleev Communications, vol. 32, no. 2, Mar. 2022, pp. 283-285. https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.044.

Keywords

AFM
chitosan films
plasma treatment
roughness
wettability

Abstract

The effect of low-frequency (15 kHz), low-pressure (10 Pa) air plasma treatment on freshly prepared chitosan films at processing times from 3 to 10 min has been explored. The films were prepared using chitosan solutions in dilute acetic acid. The influence of the plasma exposure time on the composition, morphology, and hydrophilic properties of the film surfaces is discussed.

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