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Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials

Olga Sergeevna Korkunova 1
Olga Sergeevna Korkunova
, 
Bato Chingisovich Kholkhoev 1
Bato Chingisovich Kholkhoev
, 
Vitaliy Fedorovich Burdukovskii 1
Vitaliy Fedorovich Burdukovskii
10.1016/j.mencom.2022.03.026
Published 2022-03-06
Communication , Volume 32, Issue 2, 231-233
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Korkunova O. S., Kholkhoev B. C., Burdukovskii V. F. Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials // Mendeleev Communications. 2022. Vol. 32. No. 2. pp. 231-233.
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Korkunova O. S., Kholkhoev B. C., Burdukovskii V. F. Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials // Mendeleev Communications. 2022. Vol. 32. No. 2. pp. 231-233.
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TY - JOUR
DO - 10.1016/j.mencom.2022.03.026
UR - https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.026
TI - Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials
T2 - Mendeleev Communications
AU - Korkunova, Olga Sergeevna
AU - Kholkhoev, Bato Chingisovich
AU - Burdukovskii, Vitaliy Fedorovich
PY - 2022
DA - 2022/03/06
PB - Mendeleev Communications
SP - 231-233
IS - 2
VL - 32
ER -
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@article{2022_Korkunova,
author = {Olga Sergeevna Korkunova and Bato Chingisovich Kholkhoev and Vitaliy Fedorovich Burdukovskii},
title = {Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials},
journal = {Mendeleev Communications},
year = {2022},
volume = {32},
publisher = {Mendeleev Communications},
month = {Mar},
url = {https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.026},
number = {2},
pages = {231--233},
doi = {10.1016/j.mencom.2022.03.026}
}
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Korkunova, Olga Sergeevna, et al. “Photosensitive thiol–ene composition for DLP 3D printing of thermally stable polymer materials.” Mendeleev Communications, vol. 32, no. 2, Mar. 2022, pp. 231-233. https://mendcomm.colab.ws/publications/10.1016/j.mencom.2022.03.026.

Keywords

3D printing
aromatic polyamides
DLP
photopolymerization
photosensitive compositions
thiol–ene polymerization

Abstract

N-allylated derivatives with a modification degree of 80% were obtained by reacting poly[N,N′-(1,3-phenylene)isophthalamide] with allyl bromide in the presence of a strong base. Using the obtained functionalized polyamide and pentaerythritol tetrakis(3-mercaptopropionate), we formulated new photo- sensitive compositions capable of forming crosslinked structures due to UV-initiated thiol–ene polymerization. High-resolution 3D objects that are heat resistant up to 380 °C were formed using digital light processing (DLP) 3D printing

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