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Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method

Farit Khisamutdinovich Urakaev 1
Farit Khisamutdinovich Urakaev
, 
Vyacheslav S Shevchenko 1
Vyacheslav S Shevchenko
, 
Nikolay Petrovich Pokhilenko 1
Nikolay Petrovich Pokhilenko
10.1016/j.mencom.2010.03.010
Published 2010-03-05
Communication , Volume 20, Issue 2, 95-97
5
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Urakaev F. K., Shevchenko V. S., Pokhilenko N. P. Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method // Mendeleev Communications. 2010. Vol. 20. No. 2. pp. 95-97.
GOST all authors (up to 50) Copy
Urakaev F. K., Shevchenko V. S., Pokhilenko N. P. Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method // Mendeleev Communications. 2010. Vol. 20. No. 2. pp. 95-97.
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TY - JOUR
DO - 10.1016/j.mencom.2010.03.010
UR - https://mendcomm.colab.ws/publications/10.1016/j.mencom.2010.03.010
TI - Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method
T2 - Mendeleev Communications
AU - Urakaev, Farit Khisamutdinovich
AU - Shevchenko, Vyacheslav S
AU - Pokhilenko, Nikolay Petrovich
PY - 2010
DA - 2010/03/05
PB - Mendeleev Communications
SP - 95-97
IS - 2
VL - 20
ER -
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@article{2010_Urakaev,
author = {Farit Khisamutdinovich Urakaev and Vyacheslav S Shevchenko and Nikolay Petrovich Pokhilenko},
title = {Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method},
journal = {Mendeleev Communications},
year = {2010},
volume = {20},
publisher = {Mendeleev Communications},
month = {Mar},
url = {https://mendcomm.colab.ws/publications/10.1016/j.mencom.2010.03.010},
number = {2},
pages = {95--97},
doi = {10.1016/j.mencom.2010.03.010}
}
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Urakaev, Farit Khisamutdinovich, et al. “Preparation of nanoscale particles and coatings on the basis of copper, carbon and silicon by the abrasive-reactive wear method.” Mendeleev Communications, vol. 20, no. 2, Mar. 2010, pp. 95-97. https://mendcomm.colab.ws/publications/10.1016/j.mencom.2010.03.010.

Abstract

An abrasive-reactive wear technology has been developed that utilizes wear debris as an integral component of the reaction system rather than treating it as a harmful impurity; this technology is applied to the processing of low-grade diamond and silicon by cupric milling tools, and an abnormal influence of graphite on wear degree is established.

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